CONTENT AVAILABLE | 1 l, 5 l |
---|
Colloidal Silica Suspension 50 nm Alkaline
Colloidal silica suspension for final polishing of metallographic samples.
The suspension can be mixed with etchants to enhance the polishing action.
Silica concentration 585 g/l
Median (50%) 50 nm
pH 9.5 – 10.5
Contains anti-drying agent. Shake before use
Categories: Oxide Polishing, Metallographic Polishing